The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2008

Filed:

Jan. 11, 2006
Applicants:

Katsuhiko Murakami, Kanagawa, JP;

Hideya Inoue, Yokohama, JP;

Inventors:

Katsuhiko Murakami, Kanagawa, JP;

Hideya Inoue, Yokohama, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21G 4/00 (2006.01); G01N 21/64 (2006.01); G01J 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Targetthat is arranged in the disc direction is sprayed from nozzlethat has a slit-shaped aperture. Targetis conveyed on a gas stream. He gas is used in this example. Nozzlemay be vibrated by a piezo apparatus to spray disc-shaped target. Targetthat is sprayed from nozzlereaches the irradiation position of laser light with its direction unchanged since the exterior of nozzleis maintained in a high vacuum. Synchronized with delivery of target, pulse laser lightfrom Nd:YAG light sourceis focused by lensand irradiated onto target. The spot diameter of the laser is the same 1 mm diameter as that of target. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.


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