Taipei, Taiwan

Kao-Way Tu

This inventor holds 11 USPTO granted patents and 2 published patent applications. Top assignees: Force Mos Technology Co., Ltd., Great Power Semiconductor Corp., Super Group Semiconductor Co., Ltd.. Active years: 2013-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kao-Way Tu. Retrieved from https://idiyas.com/inventor/kao-way-tu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 11 

% Patents Active = 63.6

Average Co-Inventor Count = 2.1

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • New Taipei, TW (2013 - 2021)
  • Hsinchu, TW (2022)

Company Filing History:


Years Active: 2013-2025

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11 patents (USPTO):Explore Patents

Title: Kao-Way Tu: Innovator in Metal-Oxide Semiconductors

Introduction

Kao-Way Tu is a prominent inventor based in New Taipei, Taiwan, known for his significant contributions to the field of semiconductor technology. With a total of 10 patents to his name, Tu has focused his efforts on developing cutting-edge devices that harness the power of metal-oxide semiconductors.

Latest Patents

Kao-Way Tu's latest innovative patents include a **Metal-Oxide Semiconductor Module** and a **Light-Emitting Diode Display Device**. The metal-oxide semiconductor module is characterized by multiple components separated by first trenches. Each component features a heavily doped semiconductor layer, an epitaxial layer with an indentation, and a metallic patterned contact unit. The epitaxial layer also integrates a source region and a gate region, ensuring efficient electrical connectivity.

Additionally, Tu has developed a **Metal-Oxide-Semiconductor (MOS) Device** that consists of a heavily doped substrate and an epitaxial layer. This device includes several MOS units and a metal pattern layer that is crucial for its functionality. The drain metal pattern is designed to connect seamlessly from the substrate to above the epitaxial layer.

Career Highlights

Kao-Way Tu has held significant roles in reputable companies such as Great Power Semiconductor Corporation and Force Mos Technology Co., Ltd. His work in these companies has positioned him at the forefront of semiconductor innovation, making substantial advancements in technology through his patents.

Collaborations

Throughout his career, Kao-Way Tu has collaborated with notable professionals in the industry, including Yuan-Shun Chang and Yi-Yun Tsai. These collaborations have contributed to the successful development of several patents and have enriched the semiconductor research community.

Conclusion

Kao-Way Tu exemplifies the spirit of innovation in the semiconductor industry. His 10 patents reflect his dedication to advancing technology, particularly in metal-oxide semiconductors. Through his work and collaborations, Tu continues to make a lasting impact on the field, paving the way for future developments and innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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