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For the Inventor, By the Inventor

Tokyo, Japan

Kaichiro Nakano

USPTO Granted Patents = 46 

 

Average Co-Inventor Count = 3.3

ph-index = 12

Forward Citations = 507(Granted Patents)


Location History:

  • Minato-ku, JP (2010 - 2013)
  • Tokyo, JP (1995 - 2015)

Company Filing History:

goldMedal45 out of 35,705 
 
Nec Corporation
 patents
silverMedal1 out of 196 
 
Nec C Orporation
 patents
bronzeMedal1 out of 10,250 
 
Sumitomo Electric Industries, Limited
 patents
4. 1 out of 2,145 
 
Japan Aviation Electronics Industry, Limited
 patents
where one patent can have more than one assignee

Years Active: 1995-2015

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Areas of Expertise:
Photoresist Composition
Chemically Amplified Resist
Photosensitive Resin
Optical Waveguide
Pattern Formation
Electricity Storage Device
Optical Connector
Acrylic Derivative
Negative Photoresist
Sulfonium Salt Compound
Polymer Chemistry
Monomer Development
46 patents (USPTO):Explore Patents
1. 8969483 - (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it (2015-03-03),
2. 8802798 - (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it (2014-08-12),
3. 8617744 - Electricity storage device (2013-12-31),
4. 8414733 - Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide (2013-04-09),
5. 8388238 - Ferrule, and method of producing an optical waveguide connector, and optical waveguide connector which use the ferrule (2013-03-05),
6. 8297855 - Optical connector (2012-10-30),
7. 7847017 - Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide (2010-12-07),
8. 7470499 - Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition (2008-12-30),
9. 7439005 - Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern (2008-10-21),
10. 7432035 - (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it (2008-10-07),
11. 7333683 - Structure and method for mounting LSI package onto photoelectric wiring board, information processing apparatus, optical interface, and photoelectric wiring board (2008-02-19),
12. 7232639 - Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same (2007-06-19),
13. 7192682 - Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation (2007-03-20),
14. 7186495 - (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it (2007-03-06),
15. 6924079 - Resist resin, chemical amplification type resist, and method of forming of pattern with the same (2005-08-02),

Title: Inventor Kaichiro Nakano: Pioneering Innovations in Tokyo

Introduction: Kaichiro Nakano is a renowned inventor based in Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Nakano's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable technology for healthcare monitoring, and sustainable energy solutions.

Career Highlights: With over two decades of experience in research and development, Nakano has worked with leading tech companies in Japan, spearheading projects that have received international recognition for their ingenuity.

Collaborations: Throughout his career, Nakano has collaborated with top universities and research institutions in Tokyo, fostering a culture of innovation and knowledge-sharing within the scientific community.

Conclusion: Kaichiro Nakano's dedication to pushing the boundaries of technology and his passion for creating solutions that improve lives make him a standout figure in the world of inventors and innovators.

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