The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Aug. 29, 2008
Applicants:
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
Inventors:
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 24/00 (2006.01); C08F 10/00 (2006.01); C08F 32/08 (2006.01); C08F 118/02 (2006.01); C08F 2/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: