The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Mar. 05, 2007
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R, R, Rand Rare each a hydrogen atom or a methyl group; Ris an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; Ris a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x≦1, 0≦y<1 and 0≦z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein Ris a hydrogen atom or a methyl group, and Ris a hydrocarbon group of 7 to 16 carbon atoms having an alicyclic lactone structure.