The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Nov. 28, 2012
Applicant:
Nec Corporation, Tokyo, JP;
Inventors:
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 34/02 (2006.01); C08F 134/02 (2006.01); C08F 234/02 (2006.01); C08F 8/00 (2006.01); C08F 2/00 (2006.01); C08F 118/02 (2006.01); C08F 32/08 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08F 120/28 (2006.01); C08F 20/28 (2006.01); C07D 307/93 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); C08F 120/28 (2013.01); C08F 20/28 (2013.01); C07D 307/93 (2013.01); G03F 7/039 (2013.01); Y10S 430/111 (2013.01);
Abstract
A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.