The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7192682 B1

Date of Patent:

Mar. 20, 2007

Filed:

Jun. 27, 2003

Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation

Applicants:

Katsumi Maeda, Tokyo, JP;

Kaichiro Nakano, Tokyo, JP;

Inventors:

Katsumi Maeda, Tokyo, JP;

Kaichiro Nakano, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:

Young & Thompson

Primary Examiner:

Richard L Schilling

Int. Cl.

CPC ...

G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01); C08F 10/00 (2006.01); C08F 136/00 (2006.01);

U.S. Cl.

CPC ...

Abstract

There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (V).

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