The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Jul. 02, 2001
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
Katsumi Maeda, Tokyo, JP;
Shigeyuki Iwasa, Tokyo, JP;
Kaichiro Nakano, Tokyo, JP;
Etsuo Hasegawa, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
The present invention relates to a resist resin having an acid-decomposable group, which gives rise to decomposition of the acid-decomposable group to show an increased solubility to an aqueous alkali solution by the action of an acid, wherein the resist resin has, in the main chain, an alicyclic lactone structure represented by the following general formula (1). According to the present invention, a positive-type chemically amplified resist can be obtained which has high transparency to a far-ultraviolet light having a wavelength of about 220 nm or less, excellent etching resistance, and excellent adhesion to substrate; and a fine pattern required in production of semiconductor device can be formed.(wherein Z is an alicyclic hydrocarbon group having a lactone structure).