Ju-Hyung Lee is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 14 patents to his name, Lee has made remarkable advancements that enhance the efficiency and effectiveness of CVD processes.

Latest Patents

One of Lee's latest patents is a method and apparatus for cleaning a CVD chamber. This invention utilizes cleaning gas energized to a plasma in a gas mixing volume, which is separated by an electrode from the reaction volume of the chamber. In one embodiment, a source of RF power is coupled to the lid of the chamber, while a switch is employed to connect a showerhead to ground terminals or the source of RF power. This innovative approach significantly improves the cleaning process of CVD chambers, ensuring optimal performance.

Career Highlights

Ju-Hyung Lee is currently associated with Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on developing cutting-edge technologies that address the challenges faced in CVD applications.

Collaborations

Throughout his career, Lee has collaborated with notable colleagues, including Shankar Venkataraman and Maosheng Zhao. These collaborations have fostered a creative environment that has led to the development of innovative solutions in the field.

Conclusion

Ju-Hyung Lee's contributions to the field of CVD technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator. His inventions continue to influence the industry and pave the way for future advancements.

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