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For the Inventor, By the Inventor

San Jose, CA, United States of America

Ju-Hyung Lee

USPTO Granted Patents = 14 

Average Co-Inventor Count = 7.5

ph-index = 8

Forward Citations = 623(Granted Patents)


Location History:

  • Campbell, CA (US) (2003 - 2007)
  • San Jose, CA (US) (2005 - 2010)

Company Filing History:

goldMedal14 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2003-2010

where 'Filed Patents' based on already Granted Patents

14 patents (USPTO):
1. 7654224 - Method and apparatus for cleaning a CVD chamber (2010-02-02),
2. 7500445 - Method and apparatus for cleaning a CVD chamber (2009-03-10),
3. 7465357 - Computer-readable medium that contains software for executing a method for cleaning a CVD chamber (2008-12-16),
4. 7464717 - Method for cleaning a CVD chamber (2008-12-16),
5. 7288205 - Hermetic low dielectric constant layer for barrier applications (2007-10-30),
6. 7160821 - Method of depositing low k films (2007-01-09),
7. 7151053 - Method of depositing dielectric materials including oxygen-doped silicon carbide in damascene applications (2006-12-19),
8. 6946033 - Heated gas distribution plate for a processing chamber (2005-09-20),
9. 6923189 - Cleaning of CVD chambers using remote source with cxfyoz based chemistry (2005-08-02),
10. 6902629 - Method for cleaning a process chamber (2005-06-07),
11. 6890850 - Method of depositing dielectric materials in damascene applications (2005-05-10),
12. 6806207 - Method of depositing low K films (2004-10-19),
13. 6632735 - Method of depositing low dielectric constant carbon doped silicon oxide (2003-10-14),
14. 6593247 - Method of depositing low k films using an oxidizing plasma (2003-07-15),

Title: The Innovative Contributions of Ju-Hyung Lee

Introduction

Ju-Hyung Lee is a prominent inventor based in San Jose, CA, known for his significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 14 patents to his name, Lee has made remarkable advancements that enhance the efficiency and effectiveness of CVD processes.

Latest Patents

One of Lee's latest patents is a method and apparatus for cleaning a CVD chamber. This invention utilizes cleaning gas energized to a plasma in a gas mixing volume, which is separated by an electrode from the reaction volume of the chamber. In one embodiment, a source of RF power is coupled to the lid of the chamber, while a switch is employed to connect a showerhead to ground terminals or the source of RF power. This innovative approach significantly improves the cleaning process of CVD chambers, ensuring optimal performance.

Career Highlights

Ju-Hyung Lee is currently associated with Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on developing cutting-edge technologies that address the challenges faced in CVD applications.

Collaborations

Throughout his career, Lee has collaborated with notable colleagues, including Shankar Venkataraman and Maosheng Zhao. These collaborations have fostered a creative environment that has led to the development of innovative solutions in the field.

Conclusion

Ju-Hyung Lee's contributions to the field of CVD technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator. His inventions continue to influence the industry and pave the way for future advancements.

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