The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Apr. 12, 2002
Yi Zheng, San Jose, CA (US);
Vinita Singh, Mountain View, CA (US);
Srinivas D. Nemani, San Jose, CA (US);
Chen-an Chen, Milpitas, CA (US);
Ju-hyung Lee, Campbell, CA (US);
Shankar Venkataraman, Santa Clara, CA (US);
Yi Zheng, San Jose, CA (US);
Vinita Singh, Mountain View, CA (US);
Srinivas D. Nemani, San Jose, CA (US);
Chen-An Chen, Milpitas, CA (US);
Ju-Hyung Lee, Campbell, CA (US);
Shankar Venkataraman, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for cleaning deposition chambers are presented. The cleaning methods include the use of a remote plasma source to generate reactive species from a cleaning gas to clean deposition chambers. A flow of helium or argon may be used during chamber cleaning. Radio frequency power may also be used in combination with a remote plasma source to clean deposition chambers.