The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
Jun. 19, 2006
Maosheng Zhao, Santa Clara, CA (US);
Juan Carlos Rocha-alvarez, Sunnyvale, CA (US);
Inna Shmurun, Foster City, CA (US);
Soova Sen, Sunnyvale, CA (US);
Mao D. Lim, San Jose, CA (US);
Shankar Venkataraman, Santa Clara, CA (US);
Ju-hyung Lee, San Jose, CA (US);
Maosheng Zhao, Santa Clara, CA (US);
Juan Carlos Rocha-Alvarez, Sunnyvale, CA (US);
Inna Shmurun, Foster City, CA (US);
Soova Sen, Sunnyvale, CA (US);
Mao D. Lim, San Jose, CA (US);
Shankar Venkataraman, Santa Clara, CA (US);
Ju-Hyung Lee, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.