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For the Inventor, By the Inventor

Santa Clara, CA, United States of America

Maosheng Zhao

This inventor holds 9 USPTO granted patents and 3 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2004-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maosheng Zhao. Retrieved from https://idiyas.com/inventor/maosheng-zhao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 22.2

Average Co-Inventor Count = 5.6

ph-index = 4

Forward Citations = 492(Granted Patents)


Company Filing History:

goldMedal9 out of 14,454 
 
Applied Materials, Inc.
 patents

Years Active: 2004-2010

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9 patents (USPTO):Explore Patents
1. 7654224 - Method and apparatus for cleaning a CVD chamber (2010-02-02),
2. 7500445 - Method and apparatus for cleaning a CVD chamber (2009-03-10),
3. 7465357 - Computer-readable medium that contains software for executing a method for cleaning a CVD chamber (2008-12-16),
4. 7464717 - Method for cleaning a CVD chamber (2008-12-16),
5. 6946033 - Heated gas distribution plate for a processing chamber (2005-09-20),
6. 6932092 - Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy (2005-08-23),
7. 6923189 - Cleaning of CVD chambers using remote source with cxfyoz based chemistry (2005-08-02),
8. 6914014 - Method for curing low dielectric constant film using direct current bias (2005-07-05),
9. 6797643 - Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power (2004-09-28),

Title: Maosheng Zhao: Innovator in Chemical Vapor Deposition Technology

Introduction

Maosheng Zhao is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 9 patents to his name, Zhao has established himself as a key figure in the innovation landscape.

Latest Patents

One of Zhao's latest patents is a method and apparatus for cleaning a CVD chamber. This invention utilizes cleaning gas energized to a plasma in a gas mixing volume, which is separated by an electrode from the reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power. This innovative approach enhances the efficiency and effectiveness of cleaning processes in CVD applications.

Career Highlights

Zhao is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing technologies that improve manufacturing processes and product quality. His expertise in CVD technology has been instrumental in driving innovation within the company.

Collaborations

Zhao has collaborated with notable colleagues, including Juan Carlos Rocha-Alvarez and Shankar Venkataraman. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Maosheng Zhao's contributions to the field of chemical vapor deposition technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the industry. Zhao continues to be a driving force in the realm of technological innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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