The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Jan. 16, 2003
Annamalai Lakshmanan, Santa Clara, CA (US);
Ju-hyung Lee, San Jose, CA (US);
Troy Kim, Mountain View, CA (US);
Maosheng Zhao, Santa Clara, CA (US);
Shankar Venkataraman, Santa Clara, CA (US);
Annamalai Lakshmanan, Santa Clara, CA (US);
Ju-Hyung Lee, San Jose, CA (US);
Troy Kim, Mountain View, CA (US);
Maosheng Zhao, Santa Clara, CA (US);
Shankar Venkataraman, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for cleaning a processing chamber are provided. The cleaning method includes the use of a remote plasma source to generate reactive species and an in situ RF power to generate or regenerate reactive species. The reactive species are generated from a carbon and fluorine-containing gas and an oxygen source.