Joyce S Oey Hewett

This inventor holds 23 USPTO granted patents, primarily in Process Control Engineering. Top assignee: Advanced Micro Devices Corporation. Active years: 2002-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Joyce S Oey Hewett. Retrieved from https://idiyas.com/inventor/joyce-s-oey-hewett

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23

% Patents Active = 65.2

Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 161(Granted Patents)

Company Filing History:

23 out of 13,175

Advanced Micro Devices Corporation

patents

Years Active: 2002-2008

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Areas of Expertise:

Critical Dimension Uniformity

Wafer Variations

Stepper Exposure Dose

Chemical Mechanical Polishing

Tool Controllers

Process Flow Control

Endpoint Process

Process Control Model

Manufacturing Metrics

Optical Properties

Production Lots

Device Performance

23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7334202 - Optimizing critical dimension uniformity utilizing a resist bake plate simulator (2008-02-19),

2. 7120514 - Method and apparatus for performing field-to-field compensation (2006-10-10),

3. 7103439 - Method and apparatus for initializing tool controllers based on tool event data (2006-09-05),

4. 6970757 - Method and apparatus for updating control state variables of a process control model based on rework data (2005-11-29),

5. 6967068 - Method of controlling stepper process parameters based upon optical properties of incoming anti-reflecting coating layers, and system for accomplishing same (2005-11-22),

6. 6937914 - Method and apparatus for controlling process target values based on manufacturing metrics (2005-08-30),

7. 6901340 - Method and apparatus for distinguishing between sources of process variation (2005-05-31),

8. 6801817 - Method and apparatus for integrating multiple process controllers (2004-10-05),

9. 6785586 - Method and apparatus for adaptively scheduling tool maintenance (2004-08-31),

10. 6784001 - Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same (2004-08-31),

11. 6764868 - Use of slurry waste composition to determine the amount of metal removed during chemical mechanical polishing, and system for accomplishing same (2004-07-20),

12. 6746958 - Method of controlling the duration of an endpoint polishing process in a multistage polishing process (2004-06-08),

13. 6699727 - Method for prioritizing production lots based on grade estimates and output requirements (2004-03-02),

14. 6675058 - Method and apparatus for controlling the flow of wafers through a process flow (2004-01-06),

15. 6664013 - Methods of characterizing device performance based upon the duration of an endpointed photoresist develop process, and system for accomplishing same (2003-12-16),

Title: Innovations in Semiconductor Manufacturing: The Contributions of Joyce S Oey Hewett

Introduction: Joyce S Oey Hewett, located in Austin, TX, is a prominent inventor in the field of semiconductor manufacturing, holding an impressive portfolio of 23 patents. His innovative contributions have significantly advanced the processes used in this critical industry, demonstrating his expertise and commitment to technological advancement.

Latest Patents: Among his latest patents, Joyce has developed a groundbreaking system for optimizing critical dimension uniformity in semiconductor manufacturing processes. This system utilizes a bake plate simulator to model a physical bake plate, supported by a finite element analysis engine that calculates missing information. Additionally, a lithography simulator predicts outcomes in the lithography process, making it a vital tool for predictive capabilities and process control systems. Another notable invention includes a method and apparatus for performing field-to-field compensation during semiconductor manufacturing, which involves processing semiconductor devices and performing detailed metrology data analysis to ensure precision in manufacturing.

Career Highlights: Joyce's career is marked by significant achievements within Advanced Micro Devices Corporation (AMD), where he has influenced several projects that push the boundaries of semiconductor technology. His dedication to research and development has yielded practical solutions that enhance manufacturing efficiency and product quality.

Collaborations: Throughout his career, Joyce has collaborated with notable peers, including Alexander James Pasadyn and Anthony John Toprac. Together, they have contributed to the research and development initiatives at AMD, fostering a collaborative environment that drives innovation.

Conclusion: Joyce S Oey Hewett's work exemplifies the crucial role that inventors play in the advancement of technology, particularly within the semiconductor industry. His pioneering patents not only address current challenges in manufacturing but also pave the way for future innovations that will shape the next generation of semiconductors.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]