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For the Inventor, By the Inventor

Oak Park, IL, United States of America

Jorg M Maser

USPTO Granted Patents = 9

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 35(Granted Patents)


Company Filing History:

goldMedal8 out of 877 
 
UChicago Argonne, LLC
 patents
silverMedal1 out of 348 
 
Brookhaven Science Associates, Lcc
 patents

Years Active: 2008-2020

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9 patents (USPTO):Explore Patents
1. 10663040 - Method and precision nanopositioning apparatus with compact vertical and horizontal linear nanopositioning flexure stages for implementing enhanced nanopositioning performance (2020-05-26),
2. 10393242 - Method and apparatus for implementing ultra-high stability long-vertical travel stage (2019-08-27),
3. 9613729 - Mechanical design of multiple zone plates precision alignment apparatus for hard X-ray focusing in twenty-nanometer scale (2017-04-04),
4. 9082522 - Zone compensated multilayer laue lens and apparatus and method of fabricating the same (2015-07-14),
5. 8089199 - Mechanical design of laminar weak-link rotary mechanisms with ten-degree-level travel range and ten-nanoradian-level positioning resolution (2012-01-03),
6. 7994688 - Mechanical design of laminar weak-link mechanisms with centimeter-level travel range and sub-nanometer positioning resolution (2011-08-09),
7. 7597475 - Multidimensional alignment apparatus for hard x-ray focusing with two multilayer laue lenses (2009-10-06),
8. 7440546 - Method of making and structure of multilayer laue lens for focusing hard x-rays (2008-10-21),
9. 7331714 - Optomechanical structure for a multifunctional hard x-ray nanoprobe instrument (2008-02-19),

Title: Jorg M Maser: Innovator in Nanopositioning Technology

Introduction

Jorg M Maser is a prominent inventor based in Oak Park, IL (US). He has made significant contributions to the field of nanopositioning technology, holding a total of 9 patents. His work focuses on enhancing precision and stability in nanopositioning systems, which are crucial for various scientific and industrial applications.

Latest Patents

Maser's latest patents include a "Method and precision nanopositioning apparatus with compact vertical and horizontal linear nanopositioning flexure stages for implementing enhanced nanopositioning performance." This innovative apparatus features a vertical linear nanopositioning flexure stage and a horizontal linear nanopositioning flexure stage, designed to improve performance through a symmetrically configured flexure linear guiding mechanism. Another notable patent is the "Method and apparatus for implementing ultra-high stability long-vertical travel stage." This invention utilizes stable materials and integrated air bearings to achieve ultra-high stability in vertical motion.

Career Highlights

Throughout his career, Jorg M Maser has worked with esteemed organizations such as UChicago Argonne, LLC and Brookhaven Science Associates, LLC. His experience in these institutions has allowed him to collaborate on advanced research projects and contribute to the development of cutting-edge technologies.

Collaborations

Maser has collaborated with notable colleagues, including Deming Shu and Barry Lai. Their combined expertise has furthered advancements in nanopositioning systems and related technologies.

Conclusion

Jorg M Maser is a distinguished inventor whose work in nanopositioning technology has led to significant advancements in precision engineering. His innovative patents and collaborations highlight his commitment to enhancing performance in this critical field.

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