West Linn, OR, United States of America

John B Alexy

USPTO Granted Patents = 8 

Average Co-Inventor Count = 6.7

ph-index = 5

Forward Citations = 461(Granted Patents)


Company Filing History:


Years Active: 2001-2025

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8 patents (USPTO):Explore Patents

Title: Innovations of John B Alexy

Introduction

John B Alexy is a notable inventor based in West Linn, OR (US). He has made significant contributions to the field of plasma-enhanced deposition technologies. With a total of 8 patents to his name, Alexy has demonstrated a commitment to advancing innovative methods in film deposition.

Latest Patents

Among his latest patents, Alexy has developed a method for plasma-enhanced deposition of film stacks. This method involves depositing a film stack that includes films of different compositions in a process station using plasma. The process consists of two phases: the first phase involves depositing a first film with a specific composition, while the second phase deposits a second film with a different composition on top of the first. Additionally, he has patented a PECVD apparatus designed for in-situ deposition of film stacks. This apparatus allows for the deposition of multiple film layers on a substrate without exposing it to a vacuum break between phases, ensuring a seamless transition between different reactant gas mixtures.

Career Highlights

John B Alexy has been associated with Novellus Systems Incorporated, where he has played a crucial role in developing advanced deposition technologies. His work has significantly impacted the semiconductor industry, particularly in enhancing the efficiency and quality of film deposition processes.

Collaborations

Throughout his career, Alexy has collaborated with talented individuals such as Steven T Mayer and Jason Dirk Haverkamp. These collaborations have fostered innovation and contributed to the successful development of his patented technologies.

Conclusion

John B Alexy is a distinguished inventor whose work in plasma-enhanced deposition has paved the way for advancements in film technology. His contributions continue to influence the industry and inspire future innovations.

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