The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Nov. 07, 2012
Novellus Systems, Inc., Fremont, CA (US);
Jason Haverkamp, Scotia, NY (US);
Pramod Subramonium, Beaverton, OR (US);
Joe Womack, Tigard, OR (US);
Dong Niu, West Linn, OR (US);
Keith Fox, Tigard, OR (US);
John Alexy, West Linn, OR (US);
Patrick Breiling, Portland, OR (US);
Jennifer O'Loughlin, Portland, OR (US);
Mandyam Sriram, San Jose, CA (US);
George Andrew Antonelli, Portland, OR (US);
Bart van Schravendijk, Palo Alto, CA (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
Methods of forming a film stack may include the plasma accelerated deposition of a silicon nitride film formed from the reaction of nitrogen containing precursor with silicon containing precursor, the plasma accelerated substantial elimination of silicon containing precursor from the processing chamber, the plasma accelerated deposition of a silicon oxide film atop the silicon nitride film formed from the reaction of silicon containing precursor with oxidant, and the plasma accelerated substantial elimination of oxidant from the processing chamber. Process station apparatuses for forming a film stack of silicon nitride and silicon oxide films may include a processing chamber, one or more gas delivery lines, one or more RF generators, and a system controller having machine-readable media with instructions for operating the one or more gas delivery lines, and the one or more RF generators.