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For the Inventor, By the Inventor

Portland, OR, United States of America

Jennifer O'Loughlin

This inventor holds 15 USPTO granted patents and 2 published patent applications. Top assignees: Novellus Systems Incorporated, Intel Corporation, Lam Research Corporation. Active years: 2002-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jennifer O'Loughlin. Retrieved from https://idiyas.com/inventor/jennifer-o-loughlin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 80.0

Average Co-Inventor Count = 4.8

ph-index = 10

Forward Citations = 725(Granted Patents)


Company Filing History:

goldMedal9 out of 993 
 
Novellus Systems Incorporated
 patents
silverMedal3 out of 56,365 
 
Intel Corporation
 patents
bronzeMedal2 out of 3,953 
 
Lam Research Corporation
 patents
4. 1 out of 16,035 
 
University of California
 patents

Years Active: 2002-2019

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15 patents (USPTO):Explore Patents
1. 10323323 - Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition (2019-06-18),
2. 9631276 - Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition (2017-04-25),
3. 9399228 - Method and apparatus for purging and plasma suppression in a process chamber (2016-07-26),
4. 9028924 - In-situ deposition of film stacks (2015-05-12),
5. 8741394 - In-situ deposition of film stacks (2014-06-03),
6. 8709551 - Smooth silicon-containing films (2014-04-29),
7. 8268722 - Interfacial capping layers for interconnects (2012-09-18),
8. 8217513 - Remote plasma processing of interface surfaces (2012-07-10),
9. 8084339 - Remote plasma processing of interface surfaces (2011-12-27),
10. 7858510 - Interfacial layers for electromigration resistance improvement in damascene interconnects (2010-12-28),
11. 7648899 - Interfacial layers for electromigration resistance improvement in damascene interconnects (2010-01-19),
12. 7223705 - Ambient gas treatment of porous dielectric (2007-05-29),
13. 6713873 - Adhesion between dielectric materials (2004-03-30),
14. 6645877 - Method of operating a processing chamber having multiple stations (2003-11-11),
15. 6479028 - Rapid synthesis of carbon nanotubes and carbon encapsulated metal nanoparticles by a displacement reaction (2002-11-12),

Title: Jennifer O'Loughlin: Innovator in Gas Delivery Systems

Introduction

Jennifer O'Loughlin is a prominent inventor based in Portland, OR (US). She has made significant contributions to the field of gas delivery systems, holding a total of 15 patents. Her work focuses on enhancing the efficiency and effectiveness of chemical delivery processes in various applications.

Latest Patents

One of her latest patents is titled "Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition." This innovative gas delivery system includes a first valve that communicates with a first gas source. A second valve is connected to the first valve, allowing for the controlled delivery of gases from multiple sources. The system is designed to minimize defects during processing, showcasing her expertise in the field.

Career Highlights

Throughout her career, Jennifer has worked with notable companies such as Novellus Systems Incorporated and Intel Corporation. Her experience in these leading technology firms has allowed her to develop cutting-edge solutions that address complex challenges in gas delivery systems.

Collaborations

Jennifer has collaborated with esteemed colleagues, including George Andrew Antonelli and Mandyam Sriram. These partnerships have further enriched her work and contributed to her success as an inventor.

Conclusion

Jennifer O'Loughlin's innovative contributions to gas delivery systems have established her as a leading figure in her field. Her patents and collaborations reflect her commitment to advancing technology and improving processes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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