logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9399228 B1

PDFFull Text
Date of Patent:
Jul. 26, 2016

Filed:

Feb. 06, 2013

Method and apparatus for purging and plasma suppression in a process chamber

Applicant:

Novellus Systems, Inc., San Jose, CA (US);

Inventors:

Patrick Breiling, Portland, OR (US);

Kevin Gerber, Portland, OR (US);

Jennifer O'Loughlin, Portland, OR (US);

Nagraj Shankar, Tualatin, OR (US);

Pramod Subramonium, Beaverton, OR (US);

Assignee:

NOVELLUS SYSTEMS, INC., San Jose, CA (US);

Attorney:
Primary Examiner:

Rudy Zervigon

Int. Cl.
CPC ...
B05B 1/00 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C30B 25/14 (2006.01); B05B 7/22 (2006.01); H01J 37/32 (2006.01); C23C 16/50 (2006.01); B05B 1/18 (2006.01);
U.S. Cl.
CPC ...
B05B 1/005 (2013.01); B05B 7/22 (2013.01); C23C 16/4412 (2013.01); C23C 16/455 (2013.01); C23C 16/45536 (2013.01); C23C 16/45561 (2013.01); C23C 16/45565 (2013.01); C23C 16/45591 (2013.01); C23C 16/50 (2013.01); C30B 25/14 (2013.01); H01J 37/3244 (2013.01); H01J 37/32633 (2013.01); B05B 1/18 (2013.01); Y10T 29/49826 (2015.01);
Abstract

A substrate processing system includes a showerhead that comprises a head portion and a stem portion and that delivers precursor gas to a processing chamber. A baffle includes a base portion having an outer diameter that is greater than an outer diameter of the head portion of the showerhead, that comprises a dielectric material and that is arranged between the head portion of the showerhead and an upper surface of the processing chamber.

Published as:
US2014217193A1; KR20140100435A; TW201446330A; US9399228B2; TWI603782B; KR102208576B1; KR20210013634A; KR102323167B1;

Find Patent Forward Citations

Breiling, Patrick. (2016). Method and apparatus for purging and plasma suppression in a process chamber (U.S. Patent No. 9399228). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9399228

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…