The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Feb. 02, 2011
George Andrew Antonelli, Portland, OR (US);
Jennifer O'loughlin, Portland, OR (US);
Tony Xavier, West Linn, OR (US);
Mandyam Sriram, Beaverton, OR (US);
Bart Van Schravendijk, Sunnyvale, CA (US);
Vishwanathan Rangarajan, Beaverton, OR (US);
Seshasayee Varadarajan, Lake Oswego, OR (US);
Bryan L. Buckalew, Tualatin, OR (US);
George Andrew Antonelli, Portland, OR (US);
Jennifer O'Loughlin, Portland, OR (US);
Tony Xavier, West Linn, OR (US);
Mandyam Sriram, Beaverton, OR (US);
Bart van Schravendijk, Sunnyvale, CA (US);
Vishwanathan Rangarajan, Beaverton, OR (US);
Seshasayee Varadarajan, Lake Oswego, OR (US);
Bryan L. Buckalew, Tualatin, OR (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus includes a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal disposed in the load lock and configured to support a wafer in the load lock, a remote plasma source configured to provide a remote plasma to the load lock, and an ion filter disposed between the remote plasma source and the wafer pedestal.