Beaverton, OR, United States of America

Vishwanathan Rangarajan

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.3

ph-index = 10

Forward Citations = 321(Granted Patents)


Location History:

  • San Jose, CA (US) (2014)
  • Beaverton, OR (US) (2011 - 2015)
  • Fremont, CA (US) (2017 - 2018)

Company Filing History:


Years Active: 2011-2018

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12 patents (USPTO):

Title: Innovations and Achievements of Inventor Vishwanathan Rangarajan

Introduction

Vishwanathan Rangarajan, a notable inventor based in Beaverton, Oregon, has made significant contributions to the field of materials science and engineering. With a portfolio of 12 patents, he has established himself as a leader in developing advanced deposition techniques that enhance the performance of semiconductor devices.

Latest Patents

Among his most recent work is the invention of "Plasma Activated Conformal Dielectric Film Deposition." This innovative method focuses on depositing a film on a substrate surface through surface-mediated reactions, which allows for a film to be grown over multiple cycles of reactant adsorption and reaction. Notably, this technique is characterized by the intermittent delivery of dopant species to the film between the cycles, optimizing the film's properties for various applications.

Career Highlights

Rangarajan's career is marked by his role at Novellus Systems Incorporated, a leading company in the semiconductor equipment industry. His pioneering research and development efforts have contributed to the advancement of film deposition technologies, which are critical for the manufacturing of integrated circuits.

Collaborations

Throughout his career, he has collaborated with notable coworkers such as Bart Jan Van Schravendijk and Mandyam Sriram. These partnerships have fostered innovation and propelled forward the technologies within their specialized fields, further enhancing the capabilities of Novellus Systems Incorporated.

Conclusion

Vishwanathan Rangarajan's contributions to the field of semiconductor technology through his patents and collaborative efforts exemplify the spirit of innovation. His ongoing work continues to influence advancements in film deposition techniques and solidifies his status as a leading inventor in the industry.

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