The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Sep. 23, 2011
Shankar Swaminathan, Hillsboro, OR (US);
Jon Henri, West Linn, OR (US);
Dennis M. Hausmann, Lake Oswego, OR (US);
Pramod Subramonium, Beaverton, OR (US);
Mandyam Sriram, Beaverton, OR (US);
Vishwanathan Rangarajan, Beaverton, OR (US);
Kirthi K. Kattige, Portland, OR (US);
Bart J. Van Schravendijk, Sunnyvale, CA (US);
Andrew J. Mckerrow, Lake Oswego, OR (US);
Shankar Swaminathan, Hillsboro, OR (US);
Jon Henri, West Linn, OR (US);
Dennis M. Hausmann, Lake Oswego, OR (US);
Pramod Subramonium, Beaverton, OR (US);
Mandyam Sriram, Beaverton, OR (US);
Vishwanathan Rangarajan, Beaverton, OR (US);
Kirthi K. Kattige, Portland, OR (US);
Bart J. van Schravendijk, Sunnyvale, CA (US);
Andrew J. McKerrow, Lake Oswego, OR (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.