Allen, TX, United States of America

Jinqiao Xie

This inventor holds 22 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Gallium Nitride Transistors. Top assignees: Qorvo US, Inc., Hexatech, Inc., Triquint Semiconductor Corporation. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jinqiao Xie. Retrieved from https://idiyas.com/inventor/jinqiao-xie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 90.9

 

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 214(Granted Patents)


Company Filing History:


Years Active: 2015-2026

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Areas of Expertise:
High Electron Mobility Transistor
Gallium Nitride
Aluminum Nitride
Field-Effect Transistor
Optoelectronic Devices
Thermal Conductivity
Doped Transistors
Heterojunction
Semiconductor Device
Manufacturing Process
Crystalline Layers
22 patents (USPTO):Explore Patents

Title: Innovator Jinqiao Xie: Advancements in High Electron Mobility Transistors

Introduction: Jinqiao Xie, a prominent inventor based in Allen, TX, has made significant contributions to the field of high electron mobility transistors (HEMTs), holding a remarkable portfolio of 20 patents. His inventions focus on enhancing the efficiency and performance of electronic components, showcasing innovation in semiconductor technology.

Latest Patents: Among his latest patents, Xie developed advanced designs of high electron mobility transistors incorporating a yttrium (Y) and aluminum nitride (AlN) alloy layer. This innovative layer acts as a back-barrier to improve electron confinement within the channel of HEMTs. This technology addresses the challenges faced due to reduced dimensions of HEMTs as it enhances current control and simplifies pinch-off processes. Additionally, the YAlN layer is designed to avoid lattice strain due to its lattice-matching properties with the channel layer, also providing improved thermal resistance.

Another breakthrough by Xie includes a HEMT device featuring an aluminum-doped buffer layer. This invention involves a substrate that supports epitaxial layers, ensuring that the buffer layer contains aluminum at concentrations between 0.5% and 3%. This sophisticated structure aims to optimize the performance of HEMTs by ensuring effective current control and stability.

Career Highlights: Throughout his career, Jinqiao Xie has associated with renowned companies such as Qorvo US, Inc. and Hexatech, Inc. His expertise in the semiconductor field has positioned him as a leading inventor and innovator, contributing valuable advancements to modern electronics.

Collaborations: Collaboration has been a central aspect of Xie's professional journey. He has worked alongside notable professionals, including Edward A Beam, III, and Xing Gu. These partnerships have facilitated a dynamic exchange of ideas and skills, further nurturing the evolution of high-tech products in the industry.

Conclusion: With a robust collection of patents and a steadfast commitment to innovation in the realm of high electron mobility transistors, Jinqiao Xie stands out as a key figure in the semiconductor landscape. His contributions not only advance technological capabilities but also pave the way for future innovations in electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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