The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

May. 16, 2018
Applicant:

Qorvo Us, Inc., Greensboro, NC (US);

Inventors:

Jinqiao Xie, Allen, TX (US);

Edward A. Beam, III, Plano, TX (US);

Assignee:

Qorvo US, Inc., Greensboro, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 29/66 (2006.01); H01L 29/20 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); H01L 29/0843 (2013.01); H01L 29/1029 (2013.01); H01L 29/66446 (2013.01); H01L 29/778 (2013.01);
Abstract

A field-effect transistor having a transconductance (gm) that remains within 65% of a maximum gm value over at least 85% of a gate voltage range that transitions the field-effect transistor between an on-state that allows substantial current flow through the channel layer and an off-state that prevents substantial current flow through the channel layer is disclosed. The field-effect transistor includes a substrate and a channel layer having a proximal boundary relative to the substrate and a distal boundary relative to the substrate. The channel layer is disposed over the substrate and comprises a compound semiconductor material that includes at least one element having a concentration that is graded between the proximal boundary and the distal boundary.


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