Hsinchu, Taiwan

Jane-Bai Lai

This inventor holds 9 USPTO granted patents. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Other. Active years: 2000-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jane-Bai Lai. Retrieved from https://idiyas.com/inventor/jane-bai-lai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 77.8

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 126(Granted Patents)


Location History:

  • Fueng-Yuan, TW (2000)
  • Fengyuan, TW (2002)
  • Fengyuan City, TW (2004)
  • Hsin-Chu, TW (2000 - 2007)

Company Filing History:


Years Active: 2000-2007

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9 patents (USPTO):Explore Patents

Title: The Innovations of Jane-Bai Lai: Advancing Semiconductor Technologies

Introduction

Jane-Bai Lai, an accomplished inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor technology through his innovative inventions. With a total of nine patents to his name, his work particularly focuses on methods to enhance the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents is a groundbreaking **Plasma Treatment Method for Electromigration Reduction**. This method aims to extend the mean time to failure (MTF) of metal interconnects fabricated on semiconductor wafer substrates. The invention involves creating a trench in a dielectric layer on a substrate, depositing metal in the trench, and then treating the metal with a nitrogen-based plasma. This plasma treatment accelerates grain growth and helps to align the grains in a densely packed crystal orientation, closely approximating the <111> crystal orientation texture of copper.

Another notable patent is the **Method of Wet Etching Low Dielectric Constant Materials**. This method provides an effective approach to etching low dielectric constant materials using an aqueous solution of hydrofluoric acid and hydrochloric acid. This etching solution is particularly beneficial for low dielectric constant materials that exhibit water-repellent or hydrophobic properties, with the weight ratio of hydrofluoric acid to hydrochloric acid in the solution ranging from 1:3 to 4:1.

Career Highlights

Jane-Bai Lai has built a reputable career in the semiconductor industry, having worked at Taiwan Semiconductor Manufacturing Company Limited, a leader in the field. His expertise and innovative spirit have played a crucial role in not only improving production techniques but also enhancing the overall performance of semiconductor devices.

Collaborations

Throughout his career, Lai has collaborated with prominent professionals in the industry, including Chung-Shi Liu and Chen-Hua Douglas Yu. These collaborations have undoubtedly enriched his work and contributed to the advancement of semiconductor technologies.

Conclusion

In conclusion, Jane-Bai Lai's innovative contributions to semiconductor technology through his patents and collaborative efforts have significantly influenced the field. His work exemplifies the importance of innovation in driving the industry forward and outlines a promising future for advancements in semiconductor reliability and performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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