James Allen Schlueter

Title: **Innovator Spotlight: James Allen Schlueter**

Introduction

James Allen Schlueter, an accomplished inventor based in Phoenix, AZ, has made significant contributions to the field of chemical mechanical polishing with a total of 16 patents to his name. His expertise lies in developing innovative CMP compositions and systems designed for polishing various substrates, including tungsten and cobalt.

Latest Patents

James Schlueter's recent patents focus on advancing chemical mechanical planarization processes. One patent involves formulations for chemical mechanical polishing (CMP) for tungsten-containing substrates, which includes a unique combination of nano-sized abrasives, metal compound coated organic polymer particles as solid-state catalysts, oxidizers, tungsten corrosion inhibitors, and water-based liquid carriers.

Another significant patent addresses the CMP of cobalt-containing substrates. This innovation comprises compositions that feature α-alanine, abrasive particles, salts of phosphate, corrosion inhibitors, oxidizers, and water. These compositions are noted for their high removal rates of cobalt while maintaining selectivity over dielectric films, such as TEOS and low-k films.

Career Highlights

Throughout his career, James has collaborated with leading companies in the industry, including Air Products and Chemicals, Inc. and Versum Materials US, LLC. His contributions have driven advancements in chemical mechanical polishing techniques, enhancing the efficacy and efficiency of these processes.

Collaborations

James has worked alongside talented colleagues, including Xiaobo Shi and Jae Ouk Choo, contributing to meaningful projects that push the boundaries of technology in the semiconductor industry. Their combined expertise highlights the collaborative nature of innovation within this technical field.

Conclusion

James Allen Schlueter stands out as a leading inventor whose work in chemical mechanical polishing has significantly impacted semiconductor manufacturing processes. With his patents paving the way for enhanced substrate polishing techniques, his contributions continue to influence the future of innovations in this critical area of technology.