The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Aug. 13, 2008
Applicants:
James Allen Schlueter, Phoenix, AZ (US);
Bentley J. Palmer, Phoenix, AZ (US);
Inventors:
James Allen Schlueter, Phoenix, AZ (US);
Bentley J. Palmer, Phoenix, AZ (US);
Assignee:
DuPont Air Products NanoMaterials LLC, Allentown, PA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and associated composition for chemical mechanical planarization of a chalcogenide-containing substrate (e.g., germanium/antimony/tellurium (GST)-containing substrate) are described. The composition and method afford low defect levels as well as low dishing and local erosion levels on the chalcogenide-containing substrate during CMP processing.
Schlueter, James. (2010). Method for chemical mechanical planarization of chalcogenide materials (U.S. Patent No. 7678605). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7678605
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile