Location History:
- Nara, JP (1998)
- Kyoto, JP (1991 - 2000)
- Himeji-shi, Hyogo-ken, JP (2002)
- Himeji, JP (2003 - 2006)
- Himeji-shi, Hyogo JP (2008)
- Kobe, JP (2012)
- Hyogo, JP (1995 - 2016)
Company Filing History:
3 out of 31 
2 out of 10,326 
2 out of 6 
Years Active: 1991-2016
Title: **Isao Yamada: A Pioneer in Etching Technologies**
Introduction
Isao Yamada, a distinguished inventor based in Hyogo, Japan, has made substantial contributions to the field of etching technologies. With an impressive portfolio of 15 patents, Yamada's work has advanced the methods and apparatus used in semiconductor manufacturing and surface engineering.
Latest Patents
Yamada's latest innovations include several cutting-edge patents. One notable patent is the "Etching method, etching apparatus, and storage medium," which describes an innovative etching method for anisotropically etching a copper film on a substrate surface. This process involves providing a substrate with a copper film, maintaining a vacuum within a chamber, and utilizing an organic compound in conjunction with an oxygen gas cluster ion beam to precisely etch the film. The methodology also incorporates the oxidation of copper to form a copper oxide, enhancing the anisotropic etching process.
Another significant invention is the "Charged particle separation apparatus and charged particle bombardment apparatus." This invention focuses on the separation of ionized gas clusters utilizing an electric field generated between two electrodes, which serve to deflect the trajectory of these clusters effectively.
Career Highlights
Throughout his career, Yamada has demonstrated a commitment to innovation and excellence. He has worked with notable companies, including Epion Corporation, where he further developed his expertise in etching and related technologies.
Collaborations
In his journey, Yamada has collaborated with renowned professionals such as Jiro Matsuo and Noriaki Toyoda. These partnerships have contributed to the refinement and progress of his innovative ideas, enabling him to push the boundaries of current technology.
Conclusion
Isao Yamada's contributions to etching methodologies are of great significance to the semiconductor industry. His patents not only reflect his inventive spirit but also pave the way for advancements in manufacturing processes. As technology continues to evolve, Yamada's work will likely play a pivotal role in shaping future innovations in material processing.