The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2008
Filed:
Apr. 04, 2006
Tomonori Imamura, Tokyo, JP;
Isao Yamada, Himeji-shi, Hyogo 670-0092, JP;
Noriaki Toyoda, Himeji-shi, Hyogo 670-0084, JP;
Tomonori Imamura, Tokyo, JP;
Isao Yamada, Himeji-shi, Hyogo 670-0092, JP;
Noriaki Toyoda, Himeji-shi, Hyogo 670-0084, JP;
Olympus Corporation, Tokyo, JP;
Other;
Abstract
An ultra precise polishing method includes controlling an irradiation time of a surface position of an object to be processed irradiated by a gas cluster ion beam. A profile is created and polished on the surface of the object to be processed by controlling irradiation of the gas cluster ion beam. An ultra precise polishing apparatus includes an irradiating device for irradiating a surface of an object to be processed by a gas cluster ion beam. A positioning device is provided for changing a surface position of the object to be processed, which is irradiated by the gas cluster ion beam by moving the irradiating device and the object to be processed relative to each other. A control device is provided for controlling the irradiation time of a surface position of the object to be processed irradiated by the gas cluster ion beam.