Isamu Namose

This inventor holds 23 USPTO granted patents, primarily in Electro-Optical Devices. Top assignees: Seiko Epson Corporation, Applied Materials, Inc.. Active years: 1990-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isamu Namose. Retrieved from https://idiyas.com/inventor/isamu-namose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23

% Patents Active = 60.9

Average Co-Inventor Count = 1.1

ph-index = 10

Forward Citations = 332(Granted Patents)

Location History:

Nagano, JP (1990 - 1996)
Nagano-ken, JP (2003)
Suwa, JP (1992 - 2012)

Company Filing History:

22 out of 34,268

Seiko Epson Corporation

patents

2 out of 14,454

Applied Materials, Inc.

patents

where one patent can have more than one assignee

Years Active: 1990-2012

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Areas of Expertise:

Active Matrix Device

Electro-Optical Display

Semiconductor Device

Infrared Absorption

Plasma Etching

Temperature Adjustment

Greenhouse Gas Measurement

PFC Processing

Dry Etching

Device Manufacturing

Semiconductor Structure

Trench Formation

23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8223285 - Active matrix device, method for manufacturing switching element, electro-optical display device, and electronic apparatus (2012-07-17),

2. 8013849 - Active-matrix device, electro-optical display device, and electronic apparatus (2011-09-06),

3. 7999987 - Electro-optical display device and electronic device (2011-08-16),

4. 7952041 - Active-matrix device, electro-optical display device, and electronic apparatus (2011-05-31),

5. 7692195 - Active-matrix device, electro-optical display device, and electronic apparatus (2010-04-06),

6. 7067813 - Infrared absorption measurement method, infrared absorption measurement device, and method of manufacturing semiconductor device (2006-06-27),

7. 7057175 - Infrared absorption measurement method, infrared absorption measurement device, and method of manufacturing semiconductor device (2006-06-06),

8. 7037843 - Plasma etching method (2006-05-02),

9. 6838011 - Method of processing PFC and apparatus for processing PFC (2005-01-04),

10. 6821380 - Temperature adjustment apparatus (2004-11-23),

11. 6649530 - Plasma etching at reduced pressure (2003-11-18),

12. 6642521 - Method for measuring greenhouse gases using infrared absorption spectrometer (2003-11-04),

13. 5520770 - Method of fabricating semiconductor device (1996-05-28),

14. 5348910 - Method of manufacturing a semiconductor device and the product thereby (1994-09-20),

15. 5332464 - Semiconductor device manfuacturing apparatus (1994-07-26),

Title: The Innovative Contributions of Isamu Namose

Introduction:

Isamu Namose is a notable inventor based in Suwa, Japan, recognized for his significant contributions to the field of electro-optical devices. With a remarkable portfolio of 23 patents, his work has paved the way for advancements in active matrix technology and electronic apparatuses.

Latest Patents:

Among Namose's latest innovations are several patents focusing on an active matrix device, a method for manufacturing a switching element, an electro-optical display device, and electronic apparatuses. His active matrix device comprises a substrate and a pixel electrode formed adjacently to one surface of the substrate. The innovative design includes a switching element that features a fixed electrode corresponding to the pixel electrode, along with a movable electrode that can be displaced towards the fixed electrode. This displacement is achieved by an electrostatic attraction created between the movable electrode and a driving electrode, enabling efficient electrical conduction between the wiring lines and the pixel electrode.

Career Highlights:

Namose has had an impactful career, working for prominent companies such as Seiko Epson Corporation and Applied Materials, Inc. His expertise in electro-optical display technology has contributed meaningfully to the research and development efforts within these organizations.

Collaborations:

Throughout his career, Namose has collaborated with notable coworkers, including Chester A. Szwejkowski and Ian Scot Latchford. These partnerships have fostered a collaborative environment that promotes innovation and the advancement of new technologies.

Conclusion:

In conclusion, Isamu Namose's dedication to advancing active matrix technology and electro-optical devices has resulted in a robust portfolio of patents that continue to influence the industry. His work exemplifies the spirit of innovation essential to technological progress, making significant strides in the realm of electronic apparatuses.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]