The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Mar. 13, 2001
Applicant:
Isamu Namose, Suwa, JP;
Inventor:
Isamu Namose, Suwa, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23F 1100 ; H05H 100 ;
U.S. Cl.
CPC ...
Abstract
The present invention relates to a method and an apparatus for processing PFC, which does not damage a vacuum pump, and in which maintenance and inspection works are readily performed, and an incineration process is not required. The processing apparatusis constructed with a vacuum chamberand a vacuum pumpa reaction gas introduction sectiona plasma process sectionand a polymer collection sectionthat are successively disposed through a pipingin a succeeding stage of the vacuum chamber