Hung-Yu Yeh

Title: Innovations of Inventor Hung-Yu Yeh

Introduction

Hung-Yu Yeh is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on advanced transistor designs that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Among his latest innovations are two notable patents. The first is a "Gate-all-around transistor with strained channels," which provides a semiconductor device featuring multiple semiconductor channel layers. This design includes a first semiconductor layer and a second semiconductor layer, with differing strains that optimize performance. The second patent is for a "Gate-all-around device," which comprises a plurality of nanosheets, source/drain stressors, and a gate structure that wraps around the nanosheets. This innovative configuration allows for improved electrical characteristics and device scalability.

Career Highlights

Hung-Yu Yeh has had a distinguished career, working with esteemed institutions such as National Taiwan University and Taiwan Semiconductor Manufacturing Company. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that drive modern electronics.

Collaborations

Throughout his career, Hung-Yu Yeh has collaborated with notable colleagues, including Chung-En Tsai and Chee-Wee Liu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hung-Yu Yeh's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence the development of advanced electronic devices, showcasing the importance of innovation in technology.