Hsueh-An Yang

Title: Hsueh-An Yang: Innovator in Semiconductor Technology

Introduction

Hsueh-An Yang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His innovative approaches have advanced the development of semiconductor device packages, showcasing his expertise and creativity in this critical area of technology.

Latest Patents

Among his latest patents is a method of making a semiconductor device package with a dummy gate. This patent describes a semiconductor device package that includes a first substrate with a conductive dummy gate structure disposed over its upper surface. An interconnect structure is also included, which features multiple metal layers within a dielectric structure. This design allows for efficient electrical coupling and enhances the overall functionality of the semiconductor device. Another notable patent is a method of making a semiconductor device package, which involves bonding a front surface of a first substrate to a second substrate and thinning the back surface of the first substrate. This method includes several steps, such as depositing and patterning a dielectric layer, etching the substrate, and depositing a conductive layer, all aimed at improving electrical connections within the device.

Career Highlights

Hsueh-An Yang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Walsin Lihwa Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Hsueh-An has collaborated with notable colleagues, including Weileun Fang and Hung-Yi Lin. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hsueh-An Yang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices, making a lasting impact on the industry.