Hsin-Hsien Lu, based in Hsinchu, Taiwan, is a prominent inventor with an impressive portfolio of 29 patents. His work primarily focuses on advancements in wafer cleaning technologies, which play a crucial role in semiconductor manufacturing.

Latest Patents

Among his latest innovations is an apparatus and method for wafer cleaning. This invention involves a polishing unit designed for chemical mechanical polishing (CMP) of a wafer, along with a cleaning dispensing unit that directs cleaning fluids toward the far edge of the wafer following the CMP process. Moreover, another noteworthy patent describes a brush cleaning apparatus and CMP system, which includes a wafer support and a cleaning brush made from porous material. The design ensures an effective cleaning mechanism by applying a cleaning liquid directly between the wafer and the cleaning surface.

Career Highlights

Hsin-Hsien Lu works at Taiwan Semiconductor Manufacturing Company Limited, a leader in the global semiconductor industry. His contributions have significantly enhanced the efficiency and effectiveness of wafer processing, solidifying his reputation within the field.

Collaborations

Throughout his career, Hsin-Hsien Lu has collaborated with esteemed colleagues such as Chang-Sheng Lin and Tien-I Bao. These partnerships have fostered an environment of innovation, driving the development of cutting-edge technologies in semiconductor wafer processing.

Conclusion

Hsin-Hsien Lu's contributions to wafer cleaning technologies exemplify the impact of innovative thinking in the semiconductor industry. With a robust collection of patents and a commitment to advancing the field, he continues to influence the future of semiconductor manufacturing.

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