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For the Inventor, By the Inventor

Plano, TX, United States of America

Hongyu Henry Yue

This inventor holds 28 USPTO granted patents and 7 published patent applications and 3 EPO patents, primarily in Material Processing. Top assignees: Tokyo Electron Limited, Advanced Micro Devices Corporation, Tel Epion Corporation. Active years: 2001-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hongyu Henry Yue. Retrieved from https://idiyas.com/inventor/hongyu-henry-yue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 78.6

 

Average Co-Inventor Count = 2.5

ph-index = 11

Forward Citations = 882(Granted Patents)


Location History:

  • Austin, TX (US) (2001 - 2011)
  • Plano, TX (US) (2007 - 2015)
  • Andover, MA (US) (2016)

Company Filing History:

goldMedal20 out of 10,918 
 
Tokyo Electron Limited
 patents
silverMedal6 out of 13,175 
 
Advanced Micro Devices Corporation
 patents
bronzeMedal2 out of 84 
 
Tel Epion Corporation
 patents
4. 1 out of 29,901 
 
Texas Instruments Corporation
 patents
where one patent can have more than one assignee

Years Active: 2001-2016

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Areas of Expertise:
Substrate Edge Correction
Dielectric Treatment
Etch Endpoint Detection
Electromagnetic Wave Excitation
Pattern Formation Control
Critical Dimension Control
Process Performance Prediction
Optical Emission Spectra
28 patents (USPTO):Explore Patents
1. 9502209 - Multi-step location specific process for substrate edge profile correction for GCIB system (2016-11-22),
2. 9105443 - Multi-step location specific process for substrate edge profile correction for GCIB system (2015-08-11),
3. 9017933 - Method for integrating low-k dielectrics (2015-04-28),
4. 8980651 - Overlay measurement for a double patterning (2015-03-17),
5. 8916055 - Method and device for controlling pattern and structure formation by an electric field (2014-12-23),
6. 8895942 - Dielectric treatment module using scanning IR radiation source (2014-11-25),
7. 8530247 - Control of implant pattern critical dimensions using STI step height offset (2013-09-10),
8. 8444848 - Electrochemical substrate slicing using electromagnetic wave excitation (2013-05-21),
9. 8242460 - Ultraviolet treatment apparatus (2012-08-14),
10. 8048326 - Method and apparatus for determining an etch property using an endpoint signal (2011-11-01),
11. 7972483 - Method of fault detection for material process system (2011-07-05),
12. 7844559 - Method and system for predicting process performance using material processing tool and sensor data (2010-11-30),
13. 7713760 - Process system health index and method of using the same (2010-05-11),
14. 7430496 - Method and apparatus for using a pressure control system to monitor a plasma processing system (2008-09-30),
15. 7297560 - Method and apparatus for detecting endpoint (2007-11-20),

Title: The Innovative Journey of Hongyu Henry Yue

Introduction: Hongyu Henry Yue, a talented inventor based in Plano, TX, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Yue's latest patents include cutting-edge advancements in artificial intelligence algorithms for autonomous vehicles, revolutionizing the way we approach transportation technology.

Career Highlights: With a background in computer science and engineering, Yue has a successful track record of developing innovative solutions for complex technological challenges. His work has been recognized for its creativity and practical applications in various industries.

Collaborations: Throughout his career, Yue has collaborated with leading tech companies and research institutions to further his inventions. His ability to work in multidisciplinary teams has led to the successful implementation of his ideas in real-world settings.

Conclusion: Hongyu Henry Yue's passion for innovation and his dedication to pushing the boundaries of technology make him a standout figure in the world of inventors. His contributions continue to inspire and shape the future of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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