Shanghai, China

Hong Min Huang

USPTO Granted Patents = 12 

Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 35(Granted Patents)


Location History:

  • Pudong, CN (2018 - 2019)
  • Shanghai, CN (2011 - 2021)

Company Filing History:


Years Active: 2011-2021

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12 patents (USPTO):Explore Patents

Title: Innovations of Hong Min Huang

Introduction

Hong Min Huang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on developing advanced materials and compositions that enhance the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents are two notable innovations. The first is titled "Crack-resistant polysiloxane dielectric planarizing compositions, methods and films." This invention involves a composition for planarizing a semiconductor device surface, which includes a catalyst, at least one solvent, and a polysiloxane resin that features both polysilsesquioxane and polydisiloxane blocks. The polydisiloxane blocks are defined by a specific general formula, where R and R' are independently selected from aryl or alkyl groups with substituted or unsubstituted carbons.

The second patent is "Crack-resistant silicon-based planarizing compositions, methods and films." This composition also aims to planarize semiconductor device surfaces and includes a silicon-based material along with a cross-linker that comprises a siloxane compound. The general formula for this compound specifies that R is an aliphatic group, while R, R', R'', R''', R'''', and R'''''' are independently selected from hydrogen or alkyl groups with substituted or unsubstituted carbons.

Career Highlights

Hong Min Huang is currently employed at Honeywell International Inc., where he continues to innovate and develop new technologies. His expertise in semiconductor materials has positioned him as a key player in the industry, contributing to advancements that improve device performance and manufacturing processes.

Collaborations

Throughout his career, Huang has collaborated with several talented individuals, including Ya Qun Liu and Liqiang Zhang. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Hong Min Huang's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in the industry, making him a notable figure among inventors.

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