The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2021
Filed:
Dec. 05, 2018
Applicant:
Honeywell International Inc., Morris Plains, NJ (US);
Inventors:
Helen Xiao Xu, Sunnyvale, CA (US);
Hong Min Huang, Shanghai, CN;
Assignee:
Honeywell International Inc., Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 183/10 (2006.01); C09D 7/63 (2018.01); H01L 21/3105 (2006.01); C09D 7/80 (2018.01); C09G 1/16 (2006.01); C08K 5/19 (2006.01);
U.S. Cl.
CPC ...
C09D 183/10 (2013.01); C09D 7/63 (2018.01); C09D 7/80 (2018.01); C09G 1/16 (2013.01); H01L 21/31051 (2013.01); C08K 5/19 (2013.01);
Abstract
A composition for planarizing a semiconductor device surface includes a catalyst, at least one solvent, and at least one polysiloxane resin including polysilsesquioxane blocks and polydisiloxane blocks. The polydisiloxane blocks are according to the general formula: wherein R, Rare each independently selected from the group consisting of: an aryl group or an alkyl group, with substituted or unsubstituted carbons.