The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Jun. 15, 2016
Applicant:
Honeywell International Inc., Morris Plains, NJ (US);
Inventors:
Huifeng Duan, Shanghai, CN;
Yanming Shen, Shanghai, CN;
Ya Qun Liu, Shanghai, CN;
Hong Min Huang, Shanghai, CN;
Assignee:
Honeywell International Inc., Morris Plains, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01); B05D 1/00 (2006.01); G02B 1/111 (2015.01); G02B 1/14 (2015.01);
U.S. Cl.
CPC ...
B05D 3/0272 (2013.01); B05D 1/005 (2013.01); G02B 1/111 (2013.01); G02B 1/14 (2015.01);
Abstract
A coated substrate includes a sapphire substrate and an anti-reflective coating comprising a silicon-based material, wherein the anti-reflective coating has refractive index of 1.23 to 1.45 and a Mohs hardness of at least 4. A method of coating a sapphire substrate with an anti-reflective coating includes applying a liquid formulation to a sapphire substrate to form a coated substrate, and curing the coated substrate at a temperature of at least 500° C. to form an anti-reflective layer on the sapphire substrate.