Shanghai, China

Huifeng Duan

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 5.3

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2018-2025

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7 patents (USPTO):Explore Patents

Title: Inventor Huifeng Duan: Pioneering Thermal Interface Materials in Shanghai

Introduction

Huifeng Duan is a distinguished inventor based in Shanghai, China, known for his innovative contributions in the field of thermal interface materials. With a total of six patents to his name, Duan has developed advanced solutions that enhance heat transfer from electronic devices, paving the way for improved performance and reliability.

Latest Patents

Among Huifeng Duan's latest patents are two significant inventions related to thermal gels. The first is a silicone-free thermal gel that utilizes a combination of polyether polyol, a cross-linker, a coupling agent, an antioxidant, a catalyst, and thermally conductive fillers. This innovative gel is designed for efficient heat transfer from heat-generating electronic devices such as computer chips to heat-dissipating structures, including heat spreaders and sinks. The second patent describes a gel-type thermal interface material that incorporates silicone oil and thermally conductive fillers, further enhancing the efficiency of heat transfer in electronic components.

Career Highlights

Huifeng Duan is currently employed at Honeywell International Inc., where he continues to refine and develop cutting-edge technologies in the realm of thermal management. His work not only contributes to the company’s innovation portfolio but also plays a pivotal role in advancing the electronics industry.

Collaborations

Throughout his career, Duan has collaborated with notable colleagues such as Ya Qun Liu and Liqiang Zhang, combining their expertise to push the boundaries of thermal interface materials. Their collective efforts have resulted in significant advancements and patents that benefit various applications in electronics.

Conclusion

Huifeng Duan's contributions to the field of thermal interface materials are commendable, reflecting his dedication to innovation and excellence. With his ongoing research and development at Honeywell International Inc., Duan is poised to continue making impactful strides in technology, ensuring better performance for electronic devices globally.

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