Hsinchu, Taiwan

Hong-Mao Lee

USPTO Granted Patents = 25 

Average Co-Inventor Count = 8.0

ph-index = 3

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2015-2025

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25 patents (USPTO):

Title: Innovations by Hong-Mao Lee: A Focus on Semiconductor Advancements

Introduction:

Hong-Mao Lee, based in Hsinchu, Taiwan, is a prominent inventor in the semiconductor field. With a remarkable portfolio of 20 patents, he has significantly contributed to the advancements in semiconductor device design and manufacturing.

Latest Patents:

Among his latest innovations, Hong-Mao Lee holds patents for a method of forming contact metal in semiconductor devices. This invention involves a detailed process where a source/drain feature is formed over a substrate, along with a dielectric layer above it. The process includes creating a contact trench that exposes the source/drain feature, followed by the deposition of a titanium nitride (TiN) layer and a cobalt layer within the trench. Another notable patent covers the formation and structure of conductive features, which includes a barrier layer. This involves depositing a metal layer in an opening through dielectric layers to a source/drain region, nitriding the metal layer, and forming a silicide region by reacting un-nitrided portions with the source/drain region.

Career Highlights:

Hong-Mao Lee's career has been prominently affiliated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading company in the semiconductor industry. Throughout his tenure, he has developed innovative techniques that enhance the performance and efficiency of semiconductor devices, making substantial contributions to the field.

Collaborations:

In his research and development efforts, Hong-Mao Lee has collaborated with notable colleagues such as Wei-Jung Lin and Cheng-Tung Lin. These partnerships have been instrumental in pushing the boundaries of semiconductor technology and ensuring that their innovations reach the market effectively.

Conclusion:

Hong-Mao Lee's efforts in the semiconductor field, marked by his numerous patents and collaborations, reflect his dedication to innovation and excellence. His work continues to influence the development of advanced semiconductor devices, highlighting the importance of intellectual property in driving technological progress.

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