Shanghai, China

Hong Lin


Average Co-Inventor Count = 2.0

ph-index = 6

Forward Citations = 154(Granted Patents)


Location History:

  • Beijing, CN (2004)
  • Poughkeepsie, NY (US) (2009 - 2010)
  • Mount Kisco, NY (US) (2011)
  • Yorktown Heights, NY (US) (2012 - 2013)
  • Shanghai, CN (2013 - 2024)

Company Filing History:


Years Active: 2004-2024

where 'Filed Patents' based on already Granted Patents

14 patents (USPTO):

Title: Innovations and Contributions of Inventor Hong Lin

Introduction

Hong Lin is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on innovative methods for manufacturing semiconductor structures and image sensors.

Latest Patents

One of Hong Lin's latest patents is a formation method of semiconductor structure. This invention discloses a method that includes forming a hard mask layer and a photo-lithographic pattern of a fin structure on a semiconductor substrate. The process involves patterning the hard mask layer and the substrate to achieve a fin structure with steep sidewalls. Additionally, it includes forming a protective layer on the sidewall surface, etching the substrate to create isolation structure trenches, and filling these trenches with a dielectric layer. Another notable patent is related to an image sensor and a method for manufacturing deep trench and through-silicon via of the image sensor. This patent outlines a process that reduces production steps for image sensors, enhancing efficiency in manufacturing.

Career Highlights

Throughout his career, Hong Lin has worked with notable companies such as IBM and Shanghai IC R&D Center Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Hong Lin has collaborated with several professionals in his field, including Huilong Zhu and Qin Yue Chen. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Hong Lin's contributions to semiconductor technology and image sensor manufacturing demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving production methods and enhancing the capabilities of semiconductor devices.

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