Company Filing History:

8 out of 2,874

Hitachi-high-technologies Corporation

Hitachi Haramachi Electronics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 1996-2013

Loading Chart...

15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8581187 - Method for measuring sample and measurement device (2013-11-12),

2. 8507856 - Pattern measuring method and pattern measuring device (2013-08-13),

3. 8244042 - Pattern matching method and computer program for executing pattern matching (2012-08-14),

4. 8189040 - Recipe generation system and method (2012-05-29),

5. 8019161 - Method, device and computer program of length measurement (2011-09-13),

6. 7925095 - Pattern matching method and computer program for executing pattern matching (2011-04-12),

7. 7889909 - Pattern matching method and pattern matching program (2011-02-15),

8. 7518110 - Pattern measuring method and pattern measuring device (2009-04-14),

9. 6978041 - Review work supporting system (2005-12-20),

10. 6968079 - Investigation device and investigation method (2005-11-22),

11. 6683683 - Defect inspection method and apparatus for silicon wafer (2004-01-27),

12. 6384909 - Defect inspection method and apparatus for silicon wafer (2002-05-07),

13. 6256092 - Defect inspection apparatus for silicon wafer (2001-07-03),

14. 6157444 - Defect inspection apparatus for silicon wafer (2000-12-05),

15. 5554863 - Gate turn-off thyristor (1996-09-10),

Title: Hitoshi Komuro: Innovator in Measurement Technology

Introduction

Hitoshi Komuro is a prominent inventor based in Hitachinaka, Japan. He has made significant contributions to the field of measurement technology, holding a total of 15 patents. His work focuses on advanced methods for measuring patterns in lithography processes, which are crucial for the semiconductor industry.

Latest Patents

Among his latest patents is a method for measuring samples and a measurement device. This innovation allows for the determination of displacement amounts and overlapping areas between first and second patterns formed through a double patterning lithography process. The first pattern is created through a first exposure, while the second pattern is formed during a subsequent exposure. A first image of the first pattern is captured before the second pattern is created, and a second image of both patterns is taken afterward. A two-step matching process is then performed, utilizing combined information and images of the first and second patterns. This process enables the accurate determination of displacement amounts based on the design information of the second pattern.

Another notable patent is a pattern measuring method and device that establishes a reference position for measuring points using a scanning electron microscope. This method relies on position information from a reference pattern and design data to ensure precise measurements.

Career Highlights

Hitoshi Komuro has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His experience in these organizations has allowed him to develop and refine his innovative measurement techniques.

Collaborations

Throughout his career, Komuro has collaborated with esteemed colleagues, including Hidetoshi Morokuma and Takumichi Sutani. These partnerships have contributed to the advancement of measurement technologies in the industry.

Conclusion

Hitoshi Komuro's contributions to measurement technology have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing the capabilities of measurement processes in the semiconductor industry.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com