The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2013

Filed:

Apr. 26, 2012
Applicants:

Takumichi Sutani, Hitachinaka, JP;

Ryoichi Matsuoka, Hitachinaka, JP;

Hidetoshi Morokuma, Hitachinaka, JP;

Hitoshi Komuro, Hitachinaka, JP;

Akiyuki Sugiyama, Hitachinaka, JP;

Inventors:

Takumichi Sutani, Hitachinaka, JP;

Ryoichi Matsuoka, Hitachinaka, JP;

Hidetoshi Morokuma, Hitachinaka, JP;

Hitoshi Komuro, Hitachinaka, JP;

Akiyuki Sugiyama, Hitachinaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/48 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.


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