Hitachinaka, Japan

Akiyuki Sugiyama

This inventor holds 30 USPTO granted patents and 2 published patent applications, primarily in Pattern Measurement Technology. Top assignees: Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akiyuki Sugiyama. Retrieved from https://idiyas.com/inventor/akiyuki-sugiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 86.7

Average Co-Inventor Count = 3.5

ph-index = 8

Forward Citations = 135(Granted Patents)


Location History:

  • Hitachinaka, JP (2008 - 2014)
  • Tokyo, JP (2017 - 2020)

Company Filing History:


Years Active: 2008-2025

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Areas of Expertise:
Pattern Measurement
Semiconductor Inspection
Image Processing
Lithographic Techniques
Pattern Evaluation
Charged Particle System
Template Creation
Dimensional Inspection
Pattern Matching
Scanning Electron Microscope
Pattern Displacement
30 patents (USPTO):Explore Patents

Title: Akiyuki Sugiyama: Innovator in Imaging and Patterning Technologies

Introduction

Akiyuki Sugiyama, based in Hitachinaka, Japan, is a prolific inventor known for his contributions in the field of image processing and lithography. With a remarkable portfolio of 29 patents, he has made significant strides in developing technologies that enhance imaging techniques and patterning methods.

Latest Patents

Among his latest inventions are groundbreaking patents that focus on an image processor and methods for generating patterns using self-organizing lithographic techniques. These innovations aim to produce image processing solutions suitable for samples generated through Directed Self-Assembly (DSA) techniques. His patented image processor, computer program, and associated methods prepare a template for addressing based on guide pattern data, facilitating improved visual field positioning in measurement processes.

Another notable patent introduced by Sugiyama is a pattern measurement device designed to evaluate patterns formed by non-photomask patterning methods. This device includes a computation apparatus that measures dimensions between patterns on a sample. It effectively extracts the centroid of patterns and executes position alignment with measurement reference data, ensuring accurate measurements of the patterns' dimensions.

Career Highlights

Akiyuki Sugiyama has held key positions in renowned companies such as Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation. His experience at these companies has allowed him to refine his expertise in imaging technology and contribute significantly to innovation in patterning processes.

Collaborations

During his career, Sugiyama has collaborated with notable colleagues, including Ryoichi Matsuoka and Takumichi Sutani. Their combined efforts have enhanced the development of cutting-edge technologies and practices within their field, showcasing the importance of teamwork in driving innovations forward.

Conclusion

Akiyuki Sugiyama stands out as a prominent figure in the realm of imaging and patterning technologies. His innovative patents and collaborative efforts mark him as a leading inventor, continually pushing the boundaries of what is possible in these advanced technological domains. Through his work, Sugiyama contributes significantly to the future of imaging and microfabrication methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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