The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Mar. 07, 2011
Hidetoshi Morokuma, Hitachinaka, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Ryoichi Matsuoka, Hitachinaka, JP;
Takumichi Sutani, Hitachinaka, JP;
Yasutaka Toyoda, Hitachi, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Ryoichi Matsuoka, Hitachinaka, JP;
Takumichi Sutani, Hitachinaka, JP;
Yasutaka Toyoda, Hitachi, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.