The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Mar. 30, 2023
Hitachi High-tech Corporation, Tokyo, JP;
Akiyuki Sugiyama, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is a technology that can reduce the work burden of setting measurement conditions for each circuit pattern when the same measurement procedure is performed on a plurality of circuit patterns formed on a semiconductor material. A measurement system according to the present disclosure sets a measurement point set in a reference circuit pattern for another circuit pattern having the same circuit pattern, applies inversion or rotation to the measurement point, and performs setting on the other circuit pattern, when the circuit pattern has a circuit pattern obtained by vertically inverting, horizontally inverting, or rotating a circuit pattern the same as the reference circuit pattern.