The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Sep. 16, 2009
Mihoko Kijima, Tsukuba, JP;
Shunsuke Koshihara, Hitachinaka, JP;
Hitoshi Komuro, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Mihoko Kijima, Tsukuba, JP;
Shunsuke Koshihara, Hitachinaka, JP;
Hitoshi Komuro, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An amount of displacement and an overlapping area between first and second patterns formed through a double patterning lithography process can be determined. The first pattern is formed by a first exposure while the second pattern is formed by a later second exposure. A first image of the first pattern is formed prior to the formation of the second pattern. A second image of both patterns is formed after the formation of the second pattern. A two-step matching process between combined information and images of the first and second patterns is performed. The combined information includes information regarding the first pattern, as formed, combined with design information of the second pattern. Based on a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.