The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2005
Filed:
Mar. 14, 2002
Seiji Isogai, Hitachinaka, JP;
Hitoshi Komuro, Hitachinaka, JP;
Hideo Wada, Hitachinaka, JP;
Katsuharu Shoda, Sendai, JP;
Seiji Isogai, Hitachinaka, JP;
Hitoshi Komuro, Hitachinaka, JP;
Hideo Wada, Hitachinaka, JP;
Katsuharu Shoda, Sendai, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
An object of the present invention is to increase efficiency in review work by appropriately narrowing down review work that verifies shapes of visual defects relating to an enormous amount of defects detected by a visual inspecting apparatus with high sensitivity. In order to appropriately extract defect information from an inspecting apparatus, a filter function and a sampling function are prepared by unitizing the functions. As a result, defects as review targets are narrowed down and extracted automatically using the filter function and the sampling function in combination. In addition, sequencing the filter conditions and the sampling conditions and registering the sequence enables automatic filtering and sampling on the basis of information on a wafer as a review target, and thereby only defect information on the review target is extracted.