The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Mar. 21, 2007
Hiroyuki Shindo, Hitachinaka, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Takumichi Sutani, Hitachinaka, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Hitoshi Komuro, Hitachinaka, JP;
Hiroyuki Shindo, Hitachinaka, JP;
Akiyuki Sugiyama, Hitachinaka, JP;
Takumichi Sutani, Hitachinaka, JP;
Hidetoshi Morokuma, Hitachinaka, JP;
Hitoshi Komuro, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
It is an object of the invention to provide a suitable method for identifying depression/protrusion information in a design data; and a program and an apparatus for the same; for example, even in the case that similar portions are arranged, to provide a method for enabling a pattern matching with high precision between the design data and an image obtained by an image formation apparatus or the like; and a program and an apparatus for the same. To attain the above object, a pattern matching method, wherein, using information concerning a depression and/or a protrusion of the pattern on the design data, or a pattern portion and/or a non-pattern portion on the design data, pattern matching is executed between the pattern on the design data and the pattern on said image; and a program for the same are provided.