Company Filing History:

8 out of 2,899

Seiko Instruments Inc

patents

4 out of 17

Silterra Malaysia Sdn. Bhd.

patents

Years Active: 1997-2007

Loading Chart...

12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7259071 - Semiconductor device with dual gate oxides (2007-08-21),

2. 7241665 - Shallow trench isolation (2007-07-10),

3. 7161198 - Semiconductor integrated circuit device having MOS transistor (2007-01-09),

4. 7091104 - Shallow trench isolation (2006-08-15),

5. 7056836 - Manufacturing method for a semiconductor device (2006-06-06),

6. 6818514 - Semiconductor device with dual gate oxides (2004-11-16),

7. 6680244 - Method for manufacturing semiconductor device (2004-01-20),

8. 6656780 - Method of manufacturing a semiconductor device having nitrogen ions by twice RTA processes (2003-12-02),

9. 6573557 - EEPROM cell having reduced cell area (2003-06-03),

10. 6420222 - Method of producing semiconductor having two-layer polycrystalline silicon structure (2002-07-16),

11. 5672906 - Semiconductor device having defects of deep level generated by electron (1997-09-30),

12. 5602408 - Semiconductor device having polycrystalline silicon load devices (1997-02-11),

Title: **The Innovative Contributions of Hitomi Watanabe**

Introduction

Hitomi Watanabe is a notable inventor based in Chiba, Japan, recognized for his significant contributions to the field of semiconductor technology. He holds a total of 12 patents, showcasing his innovative spirit and technical expertise. His latest patents focus on advanced semiconductor devices, reflecting his commitment to enhancing technology's capabilities.

Latest Patents

Among Hitomi Watanabe's most recent inventions is a **semiconductor device with dual gate oxides**. This invention describes a method for creating a semiconductor device featuring first and second active regions designed to operate at different voltages. The process involves the formation of isolation structures and the meticulous layering of nitride and oxide layers, ultimately leading to the creation of gate oxides of varying thicknesses.

Additionally, his patent for **shallow trench isolation** outlines a method for developing isolation structures in semiconductor substrates. This method includes precise etching techniques to create trenches with various slopes, optimizing the performance of semiconductor devices.

Career Highlights

Throughout his career, Hitomi Watanabe has been associated with prominent companies including **Seiko Instruments Inc** and **Silterra Malaysia Sdn. Bhd.**. His work at these organizations has contributed to the development of cutting-edge semiconductor solutions that have had a lasting impact on the industry.

Collaborations

Collaboration has played a crucial role in Watanabe's innovation journey. He has worked alongside talented individuals such as **Inki Kim** and **Sang Yeon Kim**. These collaborations have fostered an environment of creativity and technical excellence, enabling the advancement of semiconductor technologies.

Conclusion

Hitomi Watanabe's innovative mindset and dedication to semiconductor technology are evident through his numerous patents and collaborative efforts. His contributions not only enhance the capabilities of semiconductor devices but also inspire future innovations in the industry. As technology continues to evolve, inventors like Watanabe play a pivotal role in shaping the future.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.